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Semiconductor Wafer Inc is a leading supplier of high quality clear quartz
substrate , including fused silica wafer and fused quartz wafer in UV grade ,
optical grade and semiconductor grade .These quartz wafer are produced
by flame fused and electrically fused technique , due to it's high purity, low
thermal expansion , high tensile strength , high optical transmission and
unique electrical properties , SWI quartz wafer is suitable for a wide range
of laboratory use and high-tech semiconductor process application ,
Contact us for further information on price & delivery time .
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Quartz Wafer Application :
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• Photo mask blank
• Sensors
• High frequency circuit ( Microwave circuit )
• Biotech arrays
• Laser Optics
• Optical windows and lenses
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Quartz Wafer Feature :
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• High working temperature
• Good thermal conductivity
• High stability
• High anti corrosion
• Superior mechanical properties
• Stable dielectric constant & low dielectric loss
• High optical transmission
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Purity Level 99.999 % SiO2 Quartz Wafer
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Diameter
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1” , 2" , 3" , 4", 5", 6", 8"
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Thickness
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0.5 mm , 1 mm , 2 mm , 3 mm , 4 mm
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Surface finish
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one side or two sides polished
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Flat
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One flat as SEMI. Std.
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TTV
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<= 20 um
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Surface roughness
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Ra <= 15 A
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Mechanical Properties
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Density
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2.2 g / cm3
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Pressure-proof Intensity
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1100 Mpa
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Anti-curving Intensity
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67 Mpa
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Anti-pull Intensity
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48 Mpa
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Poisson's ratio
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0.14 ~ 0.17
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Young's modulus
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72000 Mpa
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Rigidity modulus
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31000 Mpa
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Moh's hardness
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5.5 ~ 6.5
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Thermal Properties
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Transformation point
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1120 °C
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Softening point
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1680 °C
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Annealing point
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1210 °C
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Specific heat ( 20 ~ 350 °C )
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670 J / kg °C
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Thermal conductivity ( 20 °C )
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1.4 W / m °C
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Thermal expansion coefficient
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5.5×10 -7 cm / cm °C
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Thermal processing temperature
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1700 ~ 2000 °C
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Short-term operating temperature
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1300 °C
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Long-term operating temperature
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1100 °C
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Electrical Properties
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Resistivity
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7×10 7 ohm-cm
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Insulating strength
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250 ~ 400 Kv / cm
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Dielectric constant e
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3.7~ 3.9
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Dielectric absorption coefficient.
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< 4×10 4
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Dielectric waste coefficient.
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< 1×10 4
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Optical Properties
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Refractive index ( @ 589 nm )
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Nd =1.4584
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What's the difference ?
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Fused silica wafer
( Synthetic silica )
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Fused quartz wafer
( Natural silica )
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• High OH content >1200
• Excellent optical properties
• Higher transmission in the UV range.
• Free bubbles , inclusions and contaminants.
• Very low fluorescence
• Impurity 5 ppm
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• Low OH content > 150
• Excellent thermal properties
• Contain some bubbles , inclusions and contaminants
• High fluorescence
• Impurity 20 ~ 40 ppm
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Optical Transmission %
Compared to fused quartz , fused silica wafer has excellent UV transmission ranging from 190 nm to 2500 nm
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Wave length
( nm )
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Fused silica wafer
( Synthetic silica )
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Fused quartz wafer
( Natural silica )
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190
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86.42
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73.84
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200
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86.88
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75.16
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210
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88.51
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79.90
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220
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89.09
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85.69
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230
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89.58
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87.57
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240
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89.90
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87.58
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250
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90.12
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88.64
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260
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90.46
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90.11
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280
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90.89
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90.82
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300
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91.14
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91.15
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350
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91.49
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91.45
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400
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91.72
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91.75
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500
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92.08
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91.99
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750
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92.26
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92.32
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1000
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92.52
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92.48
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2000
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93.25
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93.48
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2500
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91.58
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93.56
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