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Sputter
Target
Semiconductor
Wafer, Inc
provides a
wide range
of sputter
target for thin
film
coating
application.
High purity
sputter targets
are homogenous
, fine
grained
and
high density
and can be
machined to
required dimensions
. We
have sold
a
lot of sputter
targets to
customers for
R&D or
industry production
and have
gained
a reputation
for high performance
.
Standard
Specification
| Shape |
Disk |
Rectangle |
| Size |
1", 2" ,
3" , 4" , 5",
6" , 8" |
400 x 400
mm |
| Thickness |
0.125" ~
3" |
0.125" ~
3 " |
| Purity |
99.9% ~
99.9999 % |
99.9% ~
99.9999 % |
| Backing
Plate |
OFHC Copper |
OFHC Copper |
Sputter
Target Available
Pure
Element
Sputter Target |
Ag
, Al , B ,
C , Ce , Co
, Cr , Cu ,
Dy , Er , Fe
, Gd , Ge ,
Hf , In , La
, Mg , Mn ,
Mo , Nb , Ni
, Pb , Pr ,
Sb , Si , Sm
, Sn , Ta ,
Tb , Te , Ti
, V , W , Zn
, Zr , Y ,
Yb ... etc
.
|
Alloy
Sputter Target |
AlCu ,
AlCr , AlSi
, AlSiCu ,
AlTi , CoB
, CoFe , CoNi
, CoSi , CrCu
, CuAg , CuIn
, CuNi , CuSn
, CuZr , FeMn
, FeS , FeV
, InSn , LaAl
, NiAl , NiCr
, NiFe , NiTi
, NiV , SiCu
, TiNi , TiW
, VW , WTi
, ZnAl , ZnIn
... etc . |
Ceramic
Sputter Target |
Al2O3 ,
AlN ,
ATO , AZO ,
BaTiO3 , B4C
, BN , BST
, CdS , CdSe
, CdTe , Cr3C2
, Fe2O3 , Cr2O3
, HfC , HfO2
, ITO , IZO
, In2O3 , LaB6
, MgB2 , MgF2
, MgO , MoO3
, Mo2C , NbC
, NbN NiO ,
PZT , SiC ,
SiO2 , Si3N4
,TaC , Ta2O5
,TaN ,TiB2
,TiN , TiO2
, VC , VN ,V2O5
, WC , WO3
, YBCO , YSZ
, ZnO , ZnS
, ZnSe , ZnTe
, ZrC , ZrN
, ZrO2 ...
etc . |
|
Alloys
Target
Borides
Target
Carbides
Target
Fluorides
Target
Nitrides
Target
|
Oxides
Target
Selenides
Target
Silicides
Target
Sulfides
Target
Tellurides
Target
|
A
complete product
line of sputter
targets ranging
from metal
to compound
to
serve the
needs of thin
film industry
.
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