|
|
| |
|
Semiconductor Wafer, Inc. (SWI ) provides a wide range of sputter target for
thin film coating application. High purity sputter targets are homogenous ,
fine grained and high density and can be machined to required dimensions .
We have sold a lot of sputter targets to customers for R&D laboratory or
industry production and have gained a reputation for high performance ,
Contact us for more product informations .
|
|
| |
|
|
| |
|
|
|
Standard Specifications
|
|
Shape
|
Round
|
Rectangle
|
|
Size
|
1", 2" , 3" , 4" , 5", 6" , 8"
|
400 x 400 mm
|
|
Thickness
|
2 mm ~ 70 mm
|
2 mm ~ 70 mm
|
|
Purity
|
99.9% ~ 99.9999 %
|
99.9% ~ 99.9999 %
|
|
Backing Plate
|
OFHC Copper
|
OFHC Copper
|
|
| |
|
Manufacture Methods
|
|
• Vacuum hot pressing
• Hot isostatic pressing (HIP)
• Cold isostatic pressing (CIP)
• Vacuum sintering
• Powder metallurgy
• Vacuum arc melting (VAM)
• Vacuum induction melting (VIM)
• Forging and Rolling
|
|
| |
|
Sputter Target Available
|
|
Pure elements
Pure metals
Alloys
Rare earths
Single crystals
Compounds
Ceramics
|
Oxides
Borides
Carbides
Fluorides
Nitrides
Silicides
Tellurides
Sulfides
|
|
| |
|
Bonding & Backing Plate
|
Indium Metal - We use pure Indium metal as the bonding agent , the melting
point for Indium is 156 °C , this may limit the amount of power during
sputtering process .
Silver Epoxy – We use Ag epoxy as the bonding agent for ceramic target
that require a higher melting point .
Backing Plate – Oxygen free copper is the most common backing plate
material , due to it's excellent thermal properties .
|
|
|
|
|
|
|
Popular Ceramic Targets
|
|
Sputter Target
|
Formula
|
Purity ( % )
|
Method
|
|
ITO
|
In2O3 / SnO2
|
99.99
|
Hot pressing
|
|
IZO
|
In2O3 / ZnO
|
99.99
|
Hot pressing
|
|
Aluminum oxide
|
Al2O3
|
99.99
|
Hot pressing
|
|
Titanium carbide
|
TiC
|
99.90
|
Hot pressing
|
|
BST
|
BaxSr(1-x)TiO3
|
99.99
|
Hot pressing
|
|
PZT
|
Pb(Zr0.52Ti0.48)O3
|
99.99
|
Hot pressing
|
|
Titanium dioxide
|
TiO2
|
99.90
|
Hot pressing
|
|
YBCO
|
YBa2Cu3Ox
|
99.99
|
Hot pressing
|
|
YSZ
|
ZrO2 / Y2O3
|
99.99
|
Hot pressing
|
|
ZAO
|
ZnO / Al2O3
|
99.99
|
Hot pressing
|
|
ZGO
|
ZnO / Ga2O3
|
99.99
|
Hot pressing
|
|
Zinc oxide
|
ZnO
|
99.99
|
Hot pressing
|
|
| |
|
Impurity Content for ITO Sputter Target
|
|
Element
|
Al
|
Ba
|
Cd
|
Cu
|
Fe
|
Ni
|
Pb
|
Sb
|
Si
|
Zn
|
|
Content ( ppm )
|
5
|
5
|
5
|
10
|
10
|
10
|
10
|
5
|
15
|
5
|
|
| |
|
Pure Element Sputter Target
|
|
Rare Earth Sputter Target
|
|
Formula
|
Purity
|
Materials
|
|
Formula
|
Purity
|
Materials |
|
Ag
|
4N
|
Silver
|
|
Ce
|
3N
|
Cerium |
|
Al
|
5N
|
Aluminum
|
|
Dy
|
3N
|
Dysprosium |
|
B
|
3N
|
Boron
|
|
Er
|
3N
|
Erbium |
|
Bi
|
3N
|
Bismuth
|
|
Eu
|
3N
|
Europium |
|
C
|
3N
|
Carbon
|
|
Gd
|
3N
|
Gadolinium |
|
Co
|
3N
|
Cobalt
|
|
Ho
|
3N
|
Holmium |
|
Cr
|
3N
|
Chromium
|
|
La
|
3N
|
Lanthanum |
|
Cu
|
4N
|
Copper
|
|
Lu
|
3N
|
Lutetium |
|
Fe
|
4N
|
Iron
|
|
Nd
|
3N
|
Neodymium |
|
Ge
|
5N
|
Germanium
|
|
Pm
|
3N
|
Promethium |
|
Hf
|
3N
|
Hafnium
|
|
Pr
|
3N
|
Praseodymium |
|
In
|
4N
|
Indium
|
|
Sm
|
3N
|
Samarium |
|
Mg
|
3N
|
Magnesium
|
|
Tb
|
3N
|
Terbium |
|
Mn
|
4N
|
Manganese
|
|
Tm
|
3N
|
Thulium |
|
Mo
|
4N
|
Molybdenum
|
|
Yb
|
3N
|
Ytterbium |
|
Nb
|
3N
|
Niobium
|
|
|
|
|
|
Ni
|
4N
|
Nickel
|
|
|
|
|
|
Pb
|
5N
|
Lead
|
|
|
|
|
|
Sb
|
5N
|
Antimony
|
|
|
|
|
|
Si
|
5N
|
Silicon
|
|
|
|
|
|
Sn
|
5N
|
Tin
|
|
|
|
|
|
Ta
|
3N
|
Tantalum
|
|
|
|
|
|
Te
|
4N
|
Tellurium
|
|
|
|
|
|
Ti
|
4N
|
Titanium
|
|
|
|
|
|
V
|
3N
|
Vanadium
|
|
|
|
|
|
W
|
3N
|
Tungsten
|
|
|
|
|
|
Y
|
3N
|
Yttrium
|
|
|
|
|
|
Zn
|
5N
|
Zinc
|
|
|
|
|
|
Zr
|
3N
|
Zirconium
|
|
|
|
|
|
| |
|
Applications
|
|
• Semiconductor
• Decorative
• Hard coating
• Solar cell
• Optoelectrics
• Flat panel display
• Data storage
|
|
A complete product line of sputter targets ranging from metal to compound to
serve the needs of thin film industry .
|
| |
|
|
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |
